Semiconductor heterostructure adapted for low temperature operation.

摘要

A heterostructure comprising a surface semiconductor layer (3) having a small band gap and being adaptable to planar processing supported on a high resistance accommodation layer (2) effectively eliminating possible low impedance parallel current paths is described. The accommodation layer has a larger band gap than the layer (3) and is of intrinsic conductivity type. The small band gap layer has its Fermi level pinned in or near the conduction band edge at surfaces and grain boundaries thereby providing barrierless current flow and eliminating the usually inherent barries formed with metal contacts. Furthermore neither the semi insulating substrate (1), the accommodations layer (2) or the small band gap layer (3) need to be single crystalline lattice matched or epitaxial specific examples of the invention comprise: 1. a superconductor normal superconductor device of n-InAs-100 nanometers thick with niobium superconductor electrodes spaced 250 nanometers apart and a 100 nanometer gate in the space with the n-InAs being supported by an undoped GaAs layer on a semi-insulating GaAs substrate. 2. a heterojunction field effect transistor device having a GaAlAs gate over a channel 100 nanometers thick on an undoped GaAs layer on a semi-insulating GaAs substrate. r