发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To enhance sensitivity, to improve developability, and to enable resolution of a <=1mum resist pattern by using a specified novolak resin obtained by condensing mixed cresols containing m-cresol and p-cresol with a carbonyl compound as an alkali-soluble novolak resin. CONSTITUTION:The desired resin composition is composed of 1,2-quinonediazide compound and the alkali-soluble novolak resin obtained by condensing the mixed cresols containing 30-70mol% m-cresol and 70-30mol% p-cresol with the carbonyl compound. This novolak resin has a/b=0.4-1.5 and c/b=0.4-2, where each of a, b, and c is the maximum height in the molecular weight range of 6,300-25,000, 2,500-6,000, and 150-900, respectively, and these molecular weights are those calculated in terms of polystyrene obtained by the gel permeation chromatography method using the monodispersion polystyrene as the standard.
申请公布号 JPS632044(A) 申请公布日期 1988.01.07
申请号 JP19860146459 申请日期 1986.06.23
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 TAKAHASHI TOSHIHIKO;KAMOSHITA YOICHI;MIURA TAKAO;YOSHIDA YOSHINORI
分类号 C08L61/04;C08K5/28;G03C1/72;G03F7/023;H01L21/027 主分类号 C08L61/04
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