发明名称 IMPROVED PROCESS IN MANUFACTURE OF INTEGRATED CIRCUITS
摘要 A step and repeat process using a mask transfers circuit information onto a die forming a portion of a wafer (Fig 3). The circuit information is confined within the mask which is of octagonal shape to maximise the number of steps across a given surface area of wafer and to provide a maximum area of transferred circuits. <IMAGE>
申请公布号 GB8727958(D0) 申请公布日期 1988.01.06
申请号 GB19870027958 申请日期 1987.11.30
申请人 PLESSEY CO PLC 发明人
分类号 G03F1/00 主分类号 G03F1/00
代理机构 代理人
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