发明名称 OPPOSED TARGET TYPE SPUTTERING DEVICE
摘要 PURPOSE:To form a thin film having a uniform thickness on a broad and long- sized substrate by dividing a rectangular target which is long in the transverse direction of the substrate to plural parts on a long side and providing a magnetic field generating means so as to generate magnetism at the divided points as well. CONSTITUTION:The rectangular target T which is long in the transverse direction of the substrate in an opposed target type sputtering device is bisected to T1, T2 and the magnetic field generating means 120 is disposed along a shielding ring 110 including the respective divided sides 110a. The magnetic field generating means 120 is constituted of a core 121 of a magnetic material which is a magnetic pole and a permanent magnet 122 coupled thereto. The permanent magnet 122 is set on the outside of a target holder 101 and the shielding ring 11 is set atop a magnet holder 105. The entire surface of the target T is approximately uniformly sputtered by sputtering the target T with the above-mentioned constitution, by which the film thickness is uniformly distributed in the transverse direction of the substrate.
申请公布号 JPS63468(A) 申请公布日期 1988.01.05
申请号 JP19860142962 申请日期 1986.06.20
申请人 TEIJIN LTD 发明人 KADOKURA SADAO;HONJO KAZUHIKO;KUSUHARA AKIO;AOYANAGI HIROSHI
分类号 C23C14/34 主分类号 C23C14/34
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