| 摘要 |
A process for depositing on the surface of a substrate a layer of a chosen material having continuous gradations in refractive index in a predetermined periodic pattern. The substrate is exposed to two vapor phase reactants which react upon radiation-inducement to produce the chosen material, and the relative proportion of the reactants is varied in a predetermined and continuous sequence to produce continuous gradations in the stoichiometric composition and refractive index of the deposited layer as a function of thickness. Additionally, predetermined changes in refractive index and/or thickness across the horizontal surface of the substrate may be produced in combination with the change in refractive index as a function of thickness. Diffraction optical elements formed by such a process include various optical filters and reflective optical coatings. |
