| 摘要 |
<p>A thin film forming apparatus comprising: a vacuum tank capable of accomodating an active gas and/or an inert gas; an evaporation source (24) disposed in the vacuum tank; an electrode couple (30) disposed inside the vacuum tank in such a manner as to face the evaporation source (24) and to retain a substrate (100) as a target of vacuum deposition; a filament (28) for generating thermoelectrons, disposed between the evaporation source (24) and the electrode couple (30); a grid (26) disposed between the filament (28) and the evaporation source (24) and admitting a vacuum deposition material through it; power source means for generating a predetermined electric state inside the vacuum tank; and conductor means for electrically connecting the inside of the vacuum tank to the power source means; the grid (26) being kept at a positive potential relative to the electrode couple.</p> |
