| 发明名称 |
Solvent developable photoresist composition and process of use |
| 摘要 |
Solvent developable composition useful as photoresist contains binder formed from methylmethacrylate and a C2 to C4 alkyl methacrylate whereby improved development and/or stripping is obtained.
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| 申请公布号 |
US4716093(A) |
申请公布日期 |
1987.12.29 |
| 申请号 |
US19860839973 |
申请日期 |
1986.03.17 |
| 申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
KEMPF, RICHARD J. |
| 分类号 |
G03F7/30;G03F7/033;(IPC1-7):G03C1/495;G03C1/68 |
主分类号 |
G03F7/30 |
| 代理机构 |
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