发明名称 PHOTOMASK
摘要 PURPOSE:To easily distinguish whether a defect is caused by excess or lacking exposure or contrast defect due to defocusing or uncomplete contact by forming a check pattern as a trapezoidal shape and arranging respective check patterns adjacently. CONSTITUTION:Plural selectively formed trapezoidal patterns are adjacently arranged on an area other than a part where patterns forming prescribed circuit function elements on a photomask. In case of excess or lacking exposure, the line width of the patterns is contracted or expanded as a whole, and in case of defective contrast, a part near the upper side of the trapezoidal pattern 2 is more contracted as compared to a part near the bottom of the pattern 2, both the defective cases can be easily distinguished.
申请公布号 JPS62299969(A) 申请公布日期 1987.12.26
申请号 JP19860145525 申请日期 1986.06.20
申请人 SANYO ELECTRIC CO LTD 发明人 TOKARI RYOJI
分类号 H01L21/66;G03F1/00;G03F1/84;G03F7/20;G03F9/00;H01L21/027 主分类号 H01L21/66
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