发明名称 SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL SUPERIOR IN RESISTANCES TO PRESSURE FOG AND DESENSITIZATION
摘要 PURPOSE:To obtain a silver halide photosensitive material resistant to fog due to pressure and desensitization, high in sensitivity, and containing silver iodide localized in the insides of silver halide grains by selecting specified conditions in the ammoniacal process and specifying the silver iodide content in the high iodide cores of the grains. CONSTITUTION:The phases or layers for coating the internal cores of the silver halide grains have the silver iodide content of 40-48mol%, and the reaction conditions in this case are as follows; the ammonia concentration in the reactor for coating the cores is held in 1-3N, and besides, it is preferred to maintain pAg in 8-6.8, and pH in 9.0-11.5, and it is preferred that the 2 or more phases or layers for coating the internal cores are lowered in the content of iodide from the inside to the outside and to 0-6mol% in the average iodide content near the surfaces of the grains.
申请公布号 JPS62299962(A) 申请公布日期 1987.12.26
申请号 JP19860145776 申请日期 1986.06.20
申请人 KONICA CORP 发明人 WADA YASUNORI;HONDA BON;AOYAMA OSAMU
分类号 G03C1/035;G03C1/005;G03C1/015;G03C1/34 主分类号 G03C1/035
代理机构 代理人
主权项
地址