| 摘要 |
PURPOSE:To prevent the intrusion of an intermediate product into a film during the formation of the film by disposing a substrate into a plasma device and mounting a sticking plate for sticking at least one component in the plasma formed in said device to the device. CONSTITUTION:The sticking plate 1a is mounted to the inside wall of a vacuum vessel 2 and the mounting of the sticking plate 1b near the substrate 3 is also possible. The substrate 3 is disposed in the plasma generating part in the vacuum vessel 2. Only the ammonia 6 having the highest tendency to liquefaction sticks to the sticking plate 1a among the various intermediate products generated on the inside wall surface of the vacuum vessel 2 when the cooled sticking plate 1a is mounted to the inside wall of the vacuum vessel 2. The plasma 5 of only the nitrogen arrives at the substrate 3 surface without sticking to said plate, thus forming a silicon nitride film. The intrusion of the ammonia into the silicon nitride film is prevented if the sticking plate 1b is mounted near the substrate 3. |
