摘要 |
<p>An ion source device comprises a plasma generating vessel (l) for generating plasma therein, a plurality of magnets (2) arranged on an outer periphery of the plasma generating vessel to establish a cusp field in the plasma generating vessel, means (6, l5, 22, 23) for supplying a power to generate the plasma in the plasma generating vessel, and an anode electrode (l0, 28, 30, 32, 42, 5l, 63) arranged on an inner wall of the plasma generating vessel and adapted to be heated by electrons emitted from the plasma and maintain the heat.</p> |
申请人 |
HITACHI, LTD. |
发明人 |
SATO, TADASHI;OHNO, YASUNORI;KUROSAWA, TOMOE;SEKIMOTO, NOBUYA;HAKAMATA, YOSHIMI;KUROSAWA, YUKIO;HIRASAWA, KUNIO |