发明名称 Photographic element on a polymeric substrate with novel subbing layer.
摘要 <p>A radiation sensitive photographic element comprising a substrate with at least one polymeric surface and at least one photographic emulsion over the polymeric surface. The polymeric surface has adhered thereto a continuous gelled network or inorganic particles which provides a subbing layer having the potential for antistatic properties, antihalation properties and good coatability.</p>
申请公布号 EP0250154(A2) 申请公布日期 1987.12.23
申请号 EP19870305132 申请日期 1987.06.10
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 UBEL, MARGARET L.;KANG, SOONKUN
分类号 G03C1/91 主分类号 G03C1/91
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