发明名称 Copper cleaning and passivating for tape automated bonding
摘要 In the preparation of copper parts for the tape automated bonding of semiconductor devices, the copper parts are subjected to a mild organic acid. This treatment etches the copper, removes contaminants and passivates the surfaces so that subsequent oxidation is retarded. In the case where the copper parts are the bumps on a semiconductor wafer selective etching is avoided.
申请公布号 US4714517(A) 申请公布日期 1987.12.22
申请号 US19860861210 申请日期 1986.05.08
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 MALLADI, DEVI P.;MATHEW, RANJAN;SHAH, DIVYESH P.
分类号 C23C22/52;C23G1/10;H01L21/48;H05K3/22;(IPC1-7):C23F1/00;B44C1/22;C03C15/00;C03C25/06 主分类号 C23C22/52
代理机构 代理人
主权项
地址