| 摘要 |
PURPOSE:To eliminate the step of connecting leads with a semiconductor substrate by supplying charge to the substrate to be etched with charged particles added to an etchant. CONSTITUTION:An electrode 10 is set to a positive potential by applying a DC voltage thereto, and charged particles 12 added into an etchant 1 is positively charged by the electrode 10. A filter 9 has a function for stopping the particles 12, and the particles 12 exist only in a range between the filter 9 and the inner wall of an etching tank 7. Here, the etchant 1 is agitated by a pump 13 to feed charge through the particles 12 to a semiconductor substrate 3, which is charged positively. Thus, since the communication of the charge is executed by the particles 12 added into the etchant 1, it is not necessary to connect leads with the substrate 3.
|
