INTEGRATOR AND EXPOSURE DEVICE USING IT

摘要

PURPOSE:To uniformly print a mask pattern on the surface of a water by providing plural concentric circle-shaped recessed parts on at least one principal face of a light-transmissive substrate. CONSTITUTION:Concentric circle-shaped recessed parts 22 (22a-22d) are formed on the surface of a light-transmissive substrate 21 (like a synthetic quartz plate transparent to visible rays and <200nm rays), and both surfaces are provided with a reflection preventing multicoating 23. The far ultraviolet beam emitted from an excimer light source is uniformly diffused by the lens effect of recessed parts 22a-22d. At least one integrator is provided in the optical path of the excimer light source and a reduction lens to uniformly expand the beam diameter of the excimer light source up to a radiation area required for mask of reduction projection exposure, and all of the radiation part of the wafer is irradiated with the excimer laser light having a uniform illuminance, thus obtaining a uniform micro resist pattern.