| 摘要 |
PURPOSE:To prevent wafers from vibrating and enhance their water removal effect, by forming wafer inclination means against a rotor rotational plane so that wafer planes form angles of 2.5-30 deg. with the rotor rotational plane. CONSTITUTION:A wafer centrifugal drying device is composed of a container, a rotor 6 rotatable in the container, a cradle 5 mounted on the rotor 6, a carrier 2 in which wafers 1 are housed. A spacer 21, for example, is interposed between a cradle stopper 9 and the bottom of the cradle 5 so that a rotor 6 rotational plane forms angles of 2.5-30 deg. to wafer 1 planes. Centrifugal force on rotation of the rotor 6 then allows the wafers 1 to be stably fixed in carrier grooves, capable of preventing the wafers 1 from vibrating. Therefore, air current around the wafers 1 becomes stable, enhancing water removal effect of the wafers 1.
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