| 摘要 |
PURPOSE:To form a uniform and homogeneous deposited film at high speed by transmitting a microwave through an inlet window and a substrate through a microwave cavity resonance means to generate plasma from raw gas, and forming a coated film on the surface of the substrate. CONSTITUTION:The pressure in a vacuum chamber 2 is reduced to a specified value through an exhaust pipe 6, and then the substrate 9 is heated by a heater 10' and kept at a specified temp. The raw gas is then supplied from a feed pipe 7 to control the pressure in the vacuum vessel 2 to a specified value, and a microwave is simultaneously radiated into the vacuum vessel 2 from an electric power source 5 through square cavity resonators 12a and 12b, dielectric windows 12a and 12b, and the substrate 9. Consequently, plasma 11 is generated, a film is formed on the substrate 9, the substrate 9 is successively moved, and a coated film is formed on the whole surface. At this time, a short-circuit surface is formed by the microwave reflected from the plasma interface in the cavity resonator 12 and resonated with the microwave by adjusting the position of a terminal short-circuit plate 13, hence a standing wave 14 having a fundamental wavelength of lambda is formed, the standing wave 14 is changed at intervals of lambda/4 and compensated with the generated plasma 11, and a uniform distribution is obtained in the widthwise direction of the substrate 9. |
