| 摘要 |
PURPOSE:To easily control film thickness, electrical characteristics and hardness by depositing amorphous aluminum oxide by an ion plating method on the surface. CONSTITUTION:A photosensitive layer is formed on an aluminum substrate by forming a charge transfer layer, charge generating layer and overcoat layer on said substrate. The substrate 1 having such photosensitive layer is disposed in a vacuum vessel 21 and is rotated. The substrate is connected to a DC power source 31. An ionizing power source 24 and a crucible 26 contg. Al2O3 25 are disposed in the vacuum vessel 21. The Al2O3 25 is evaporated by an electron gun 27 and an electron beam 28, by which the Al2O3 vapor is ionized and is ion-plated to the surface of the substrate 1 to form the light transmissive protective film. Since the protective film is formed by the ion plating of the Al2O3, the uniform protective film is quickly formed on the large-area photosensitive body and the wear resistance and durability thereof are improved. |
