| 摘要 |
PURPOSE:To completely eliminate a processing residue from a magnetic disk surface by forming a magnetic coating layer onto a base, applying etching processing so as to incinerate the residue on the surface of a disk coating film. CONSTITUTION:Magnetic disks D1-Dn suspended to an arm 3 in an asher device 2 have a magnetic coating layer on the base already. A resin layer including magnetic powder is used mainly for the magnetic coating layer, many minute projections exist on the surface and many processing residues exist on the surface. While a gas is being introduced into the asher device 2, in impressing a high frequency electric field by a couple of high frequency electrodes 1a, 1b, the magnetic disk D1-Dn in the asher device 2 are subjected to plasma etching processing. The processing residue on the magnetic disk face is brought completely into ash by the plasma etching processing.
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