| 摘要 |
PURPOSE:To enhance a moisture removing effect by inclining the wafer surface with respect to the rotor rotating surface at 2.5-30 deg. to spin dry it, thereby preventing the wafer from vibrating. CONSTITUTION:A spacer 21 is secured to the bottom of a carrier 2 in contact with a cradle stopper, a wafer is rotated while holding an angle theta with respect to a surface perpendicular to a rotational shaft 7 to dehydrate to dry it. A centrifugal force inclined with respect to the wafer surface is applied, the wafer is stably secured to a carrier groove to prevent it from vibrating. As a result, dust generation from the contact of the wafer with the carrier groove is reduced. Further, the air stream at the periphery of the wafer is stabilized to enhance the moisture removing effect of the wafer by the air stream.
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