发明名称 SEMICONDUCTOR DRYING DEVICE
摘要 PURPOSE:To prevent the surface of a semiconductor from being contaminated by providing an air stream contact preventing hood between a stationary gas and the semiconductor to prevent a static electricity from being generated on the semiconductor. CONSTITUTION:A semiconductor substrate 2 and a carrier 4 are rotated at a high speed at a rotational shaft 1 as a center. At this time, the air in a drying tank 6 is stopped. A hood 3 is provided outside the substrate 2 and the carrier 4 to prevent the high speed air stream from contacting the surface of the substrate. Thus, it can prevent a static electricity from being generated on the substrate to prevent the substrate from being contaminated due to the adherence of contaminant by means of static electricity.
申请公布号 JPS62291926(A) 申请公布日期 1987.12.18
申请号 JP19860136497 申请日期 1986.06.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NAKAO ICHIRO;SHITSUPOU OSAMU
分类号 F26B5/08;H01L21/304 主分类号 F26B5/08
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