发明名称 METHOD AND APPARATUS FOR VACUUM DEPOSITION
摘要 PURPOSE:To quickly obtain a smooth vapor-deposited film with decreased splashes by boiling, etc., of the melt of a material for vacuum deposition by immersing and passing at least the surface of a conveying means in the melt and forming the thin layer of the above-mentioned material on the surface then heating and evaporating the material. CONSTITUTION:The material 3 for vapor deposition such as Se in the molten liquid pool 2 of a device 1 for vacuum deposition under the reduced pressure is heated to the m.p. temp. thereof and the conveying roller 4 such as cylindrical body is rotated in an arrow direction so that the surface thereof is immersed and passed in the above-mentioned material 3. The melt of the material 3 is coated on the surface of the roller 4 by such contact and the melt is formed to the thinner layer by the rotation. The thin-layered material is conveyed near to a proper heating means 5 such as halogen lamp provided near the roller and is evaporated by which the vapor-deposited film of Se, etc., is obtd. on a substrate for vapor deposition not shown is the figure.
申请公布号 JPS62290862(A) 申请公布日期 1987.12.17
申请号 JP19860134028 申请日期 1986.06.09
申请人 FUJI XEROX CO LTD 发明人 SASAKI MASAHIRO;SONE MASAHIRO
分类号 C23C14/24 主分类号 C23C14/24
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