| 摘要 |
PURPOSE:To form uniform dyeing layers and manufacture a solid state color image sensing device with excellent color characteristics by a method wherein ordinary manufacturing processes are carried out after the peripheral region of the solid state color image sensing device is engraved to be made lower than the picture element region. CONSTITUTION:After a peripheral region 200 which is formed around a picture element region 100 is engraved to be made lower than the picture element region 100, a plurality of photosensitive parts are formed in the picture element region 100 and necessary wirings for the photosensitive parts are formed in the peripheral region 200. After that, color filter layers are formed on the predetermined photosensitive parts in the picture element region 100. For instance, the part of a semiconductor substrate 1 which is to be the peripheral region 200 is engraved down by about 1-10 mum by dry etching. Then photodiodes 2, an insulating film 3, a PSG film 4, aluminum light- shielding films 5 and a smoothening layer 6 are formed in the picture element region 100 and a bonding pad 11 and a dividing groove 12 are formed in the peripheral region 200. Then a cyanic dyeing layer 7, an intermediate layer 8 and a yellow dyeing layer 9 are formed and further a protective layer 10 is formed to complete a solid state color image sensing device.
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