| 摘要 |
PURPOSE:To manufacture reproducible insulators even at an indoor temperature by using i-type carbon as a MIM type element. CONSTITUTION:Metal electrode films 2 of Al, NiCr, Ta, and others are formed on a substrate 1 by a vaporization or spattering process and the like. A resist film 5 is formed on the metal electrode films 2 and an etching treatment with the resist film as a mask patternizes the metal electrode films 2. And then, an i-type carbon film 3 is formed to form a metal electrode film 4 of Al and the like on the above i-type carbon film. In a case of patternizing the i-type carbon film 3, the resist film 5 of required patterns is formed prior to forming the metal electrode film 4 and its film 4 is formed after treating by etching. The use of i-type carbon as an insulator makes it possible to use plastic films and the like as the substrate and also to save costs.
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