发明名称 CONTINUOUS VACUUM DEPOSITION DEVICE
摘要 PURPOSE:To efficiently stick metal vapor only to the surface of a strip where metal vapor ports face by providing the vapor ports which are in sliding contact with the surface of the strip in a vapor deposition chamber turned by a guide roll apart at a slight spacing therefrom and are opened to face said surface. CONSTITUTION:The gas of the molten metal from an evaporating crucible 5 is conducted by a duct 6 onto the surface of the strip 2 transferred by the guide roll 4. Upper and lower guide rails 7 provided to the top end of the duct 6 and right and left vapor shielding plates 8 which are movable by being guided by said rails form the metal vapor ports facing the strip 2. Inlet side and outlet side sealing plates 10, 11 facing the surface of the strip 2 are provided before and behind the vapor ports. The spacings 23 between the strip 2 and said vapor ports 7, 8 as well as the sealing plates 10, 11 are adjusted to the min. spacings by the advancing operation of the roll 4 to the ports 7, 8 by a driving device. The metal vapor is thereby stuck only to the surface of the strip 2 facing the vapor ports 7, 8 without leaking to the circumferenece.
申请公布号 JPS62290868(A) 申请公布日期 1987.12.17
申请号 JP19860135332 申请日期 1986.06.11
申请人 SUMITOMO HEAVY IND LTD 发明人 MAEDA MORIO
分类号 C23C14/16;C23C14/24;C23C14/56 主分类号 C23C14/16
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