发明名称 METHOD AND APPARATUS FOR EVAPORATION FOR VACUUM DEPOSITION
摘要 PURPOSE:To obtain a vapor deposited film having excellent smoothness and good quality in a relatively short period by pouring a molten material for vapor deposition onto a conveying means under movement to form said material into a liquid film state, then heating and evaporating the same on the conveying means. CONSTITUTION:The material for vapor deposition on a hopper 2 for supplying the melt 3 of the above-mentioned material is melted by a heater 4 for heating and is dropped in the form of molten microbodies from a pouring hole 5 onto a metallic belt (conveying means) 6 under movement in the specified direction. The melt 3 dropped onto the belt 6 forms the thin liquid film which is gradually evaporated by heating with a heating roller 7 in common use as a belt driver and a heater 8 for heating the belt while the melt is conveyed by the belt 6. The melt 3 failing to be evaporated is thoroughly evaporated by a roller 7' for heating the belt in common use as a belt driver. The vapor deposited film which has no projections by splashes and has excellent smoothness is thereby formed on a substrate.
申请公布号 JPS62290863(A) 申请公布日期 1987.12.17
申请号 JP19860134029 申请日期 1986.06.09
申请人 FUJI XEROX CO LTD 发明人 SONE MASAHIRO;SASAKI MASAHIRO
分类号 C23C14/24 主分类号 C23C14/24
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