发明名称 |
PALLADIUM ACTIVATION OF SILICON IRON PRIOR TO ELECTROLESS NICKEL PLATING |
摘要 |
<p>A method for electroless nickel plating of silicon-iron which has been heat treated prior to the plating operation and subjected to thermal shock after the plating operation includes the steps of cleaning the surface of the silicon-iron with a fluoride etch salt, forming a thin deposit of palladium on the clean surface of the silicon-iron, hardening the palladium deposit by treatment with a solution of ammonium hydroxide and nickel plating the silicon-iron using an electroless nickel plating solution, followed by baking at about 250 DEG F. for about six hours.</p> |
申请公布号 |
EP0114930(B1) |
申请公布日期 |
1987.12.16 |
申请号 |
EP19830109031 |
申请日期 |
1983.09.13 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
PULIGANDLA, VISWANADHAM;VERMA, DEEPAK KUMAR |
分类号 |
C23C18/16;C23C18/18;C23C18/34;(IPC1-7):C23C18/18 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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