| 摘要 |
<p>PURPOSE:To prevent the generation of flaws by the external force of a mask and the decrease of a yield by sticking of dust thereto and to improve the productivity of semiconductor integrated circuits by using synthetic quartz glass having a specific transmittivity as a thin transparent film. CONSTITUTION:The synthetic quartz glass which has 5mm-10mum thickness and has at least >=90% transmittivity in a 200-500nm wavelength region is used as the thin transparent film of a thin transparent film-like cover body to be installed apart at a specified distance from a substrate surface. Such synthetic quartz glass is obtd. by the hydrolysis of, for example, gaseous SiCl4 in an oxyhydrogen flame, the reaction of the gaseous SiCl4 and gaseous O2 in a plasma flame or the CVD of the gaseous SiCl4 or SIH4 and H2O, etc.; the synthetic quartz glass formed by the hydrolysis of the gaseous SiCl4 in the oxyhydrogen flame, by which the uniform glass plate of a large area necessary as the protective dustproof body of the mask is economically obtd. is most preferable. A method for fixing the synthetic quartz glass plate to a mounting frame is exemplified by fixing by an adhesive agent, fixing by a gasket having a suitable shape, etc.</p> |
