| 摘要 |
PURPOSE:To make it possible to automate inspection, by generating scattered reflected light so that the shoulder part of each mark pattern is exposed at the removed part of a resist layer only in the case a positioning error exceeds an allowable error and exposure to light is performed, and jusging the quality of the positioning of the exposure based on the presence or absence of the scattered reflected light. CONSTITUTION:A removed region 4 of a resist layer 3 is formed by the transfer of each mask pattern, which is newly provided at a position corresponding to each mark pattern 2 of a mask used for exposure to light. When a positioning error is zero, the center of the region 4 agrees with the center of the mark pattern 2. The region is made smaller than the mark pattern 2 by an allowable positioning error delta to the inside. When light A is projected on a substrate 1, scattered reflected light B is generated from a shoulder part 2a of the mark pattern 2 when the positioning error of the exposure exceeds the allowable error delta. When the positioning error is within the allowable error delta, the scattered reflected light B is not generated. Therefore, by detecting the presence or absence of the scattered reflected light, the quality of the positioning of the exposure to the light can be judged.
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