| 摘要 |
PURPOSE:To enable easier maintenance by disposing evaporating sources and ion sources along side a member for vapor deposition and conveying the member for vapor deposition perpendicularly so that the dust of the evaporated vapor deposition material is not dropped to the ion sources. CONSTITUTION:This ion beam vapor deposition device is formed of a vacuum vessel, conveying means 12 for conveying the sheet-like member for vapor deposition perpendicularly in said vessel, the evaporating sources 16a-d, a bias power source, and the ion sources 18a-d. The evaporating sources 16a-d are provided alongside the member 14 and evaporate and ionize the vapor deposition material by arc discharge. The above-mentioned bias power source attracts the ionized vapor deposition material to the member 14 by impressing a voltage between the vacuum vessel and the member 14. The ion sources 18a-d radiate ions to the vapor deposited layers deposited by evaporation on the surfaces of the member 14.
|
