| 摘要 |
PURPOSE:To project a beam of alignment light in an exposure light flux from outside or take it out therefrom, to facilitate alignment and to make an aligner small in size, by a construction wherein a spectoscopic means of reflecting a beam of exposure light and transmitting the beam of alignment light which is a non-printing light is disposed between a projection lens and a negative plate. CONSTITUTION:A pattern of a reticle 1 is projected onto the surface of a wafer 2 by means of a projection lens 3 and a dichroic film 4 of parallel-plate glass of an aligner and exposed. Exposure lights separated by this dichroic film 4 are combined in an alignment detection system constituted by first and second microscope blocks 8 and 9. In this block 9, a coma compensating plate 20, a field lens 21, a telecontric compensating lens 22, an astigmatism and coma correction lens 25, an imaging lens 27, etc. are provided. While the exposure light is reflected, an alignment light, which is a non-printing light, is transmitted and projected in an exposure light flux from outside or taken out therefrom, alignment is facilitated, and the aligner is made small in size.
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