| 摘要 |
PURPOSE:To increase solubility against an org. solvent and compatibility with a silicone resin, without deteriorating durability of a photosensitive resin against an oxygen plasma by using a specific bisazide to a photocrosslinking agent. CONSTITUTION:The new bisazide shown by the formula is produced by reacting 1,3-dichloro-1,3,-dimethyl diphenyl disiloxane with sodium azide. When the bisazide is used as the photocrosslinking agent, the photoresist having the large solubility against the org. solvent, and the excellent compatibility with the silicone resin, without injuring the durability of the silicone resin against the oxygen plasma, is obtd. |
