发明名称 RESIN OPTICAL MATERIAL HAVING IMPROVED IMPACT RESISTANCE
摘要 PURPOSE:To provide the excellent resistance to impact and wear to a titled material by forming an antireflection film consisting of an inorg. material on the surface layer of a cured film obtd. by heating and curing a specific silicon hard coat compd. CONSTITUTION:The thin resin film essentially consisting of an copolymer of an acrylic and methacrylic compd. and arom. vinyl compd. is provided to 0.1-2mu film thickness on the surface of a transparent synthetic resin material. The silicon cured film is then provided on the surface layer thereof to 1-10mum film thickness by heating and curing the compsn. essentially consisting of 1 or >=2 kinds of the compds. of the org. silicon compds. and partial condensation product thereof as well as a multifunctional epoxy compd. and curing catalyst. The antireflection layer consisting of the inorg. compd. is further provided on the surface layer thereof. In the formulas I, II, R<1> denotes an epoxy group, methacryloxyl group, amino group, etc., R<2> denotes hydrogen, methyl-, vinyl group, etc., R<3> denotes a hydrocarbon group of 1-4C, alkoxylalkyl group, etc., (a) denotes 0-2 integer.
申请公布号 JPS62280701(A) 申请公布日期 1987.12.05
申请号 JP19860124142 申请日期 1986.05.29
申请人 SEIKO EPSON CORP 发明人 KAWASHIMA JUNJI;MOGAMI TAKAO
分类号 G02B1/04;G02B1/10 主分类号 G02B1/04
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