| 摘要 |
PURPOSE:To obtain the new photosensitive composition having sufficiently a high sensitivity by incorporating a compd. capable of producing an acid by radiating an active ray, and a specific compd. capable of decomposing by the acid to the photosensitive composition. CONSTITUTION:The titled composition contains the compd. capable of producing the acid by radiating the active ray, and the compd. which has at least one of the structural units shown by the formula, and is capable of decomposing by the acid. The compd. capable of decomposing by the acid has the structural unit shown by the formula. The compd. having at least one of the structural unit shown by the formula is preferably the compd. contg. at least one of the structural unit of orthosilicate. Said compd. is synthesized by reacting for example, at least one of the compd. having at least one of a phenolic hydroxyl group and/or at least one of an alcoholic hydroxyl group and SiCl4 or Si(OR5)4, etc., in one step or more than two steps reaction. The compd. capable of producing the acid principally includes all organohalo compd. which is well-known as a photo-initiator capable of forming a free radical. |
