| 摘要 |
PURPOSE:To flatten the surface with films having a small thickness, by repeatedly applying photoresist films of a naphthoquinone diazido compound soluble in monochlorobenzene. CONSTITUTION:Solutlon of naphthoquinone diazido sulf on acid ester in monochiorobenzene is filtered and applied on an Si substrate 1 having steps on the surface by the spin coating method so as to form a first layer 2. The structure is then baked and the whole surface thereof is irradiated with ultraviolet rays. Similar processes are repeated for forming second and third layers 3 and 4. In this manner, the stepped surface of the substrate can be flattened with films having a relatively small thickness and, therefore, desirable etching can be performed.
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