| 摘要 |
A deposition apparatus (10) including a gas discharge head (17) whose bottom surface is positioned directly above and parallel to the surface of a specimen (13) on which a layer of film (20) is to be deposited, the gas discharge head having orifices (18) formed in said bottom surface arranged in a hexagonal array. The gas discharge head includes an internal chamber (14) and an entrance orifice (16) for injecting gaseous material (12) into the chamber (14) opposite to said orifice surface. A baffle (62) may be placed in front of said entrance orifice to deflect gaseous material as the material enters the interior chamber (14). |
