| 摘要 |
PURPOSE:To perform high-accuracy positioning even if the position relation between a position detecting means and a detecting means changes by driving the driving means by a specific quantity and measuring the movement quantity of a body, and calculating the relation between the detecting means and driving means from the measurement result. CONSTITUTION:When detection points (a) and (b) where measurement is performed by detecting devices 3 and 4 and operation points (c) and (d) at the time of driving by driving devices 5 and 6 are specific positions or in specific position relation, an equation holds (where h1 and h2 are the quantities of driving of the devices 5 and 6 for positioning a wafer 2, K11-K22 are values for relating the devices 3 and 4 with the devices 5 and 6, and g1' and g2' are the quantities of deviation from the desired position of the wafer 2). Consequently, the quantities of driving of the devices 5 and 6 are found from the distance measured by the devices 3 and 4 and a mask 1 and the water 2 are positioned. The position deviation detection points and operation points, however, are different actually and a defect in positioning is caused. For the purpose, the values K11-K22 for relating the devices 3 and 4 with the devices 5 and 6 are found before the positioning and those values are used to perform the high- accuracy positioning.
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