| 摘要 |
PURPOSE:To minimize a C-axis dispersion angle by providing a magnetic Co film on a glass substrate polished with abrasive grains having about >=1mum average particle size. CONSTITUTION:The surface of the glass substrate provided with the magnetic Co film having hcp structure such as, for example, Co-Cr, Co-Ni or Co-Cr-Ta by plating means such as sputtering is polished with the abrasive grains having about >=1mum average particle size to decrease the C-axis dispersion angle DELTAtheta50 of the magnetic film. While the time for polishing with the abrasive grains having about >=1mum average particle size varies with polishing methods, the polishing for about 10sec is enough to improve the characteristics such as the C-axis dispersion angle DELTAtheta50 and peak intensity I(002). The C-axis dispersion angle DELTAtheta50 and the variance thereof are thereby decreased and the magnetic recording medium which has high vertical magnetic anisotropy, is suitable for high-density recording and has uniform characteristics is obtd.
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