| 摘要 |
<p>PURPOSE:To simplify the manufacturing process of an active matrix liquid crystal display so as to obtain high quality ones at low cost, by reducing the number of photolithographic processes. CONSTITUTION:A transparent conductive film 11 and metallic layer 12 are formed on a transparent insulating substrate 10 in a laminated state and picture element electrode section 15 is formed in the state of the matrix of the conductor body composed of the transparent conductive film 11 and metallic layer 12 by photolithographic process. At the same time, an insulating film 16 and prescribed amorphous silicon film 17 are laminated on the substrate 10 except the sections where the picture element electrode sections 15 are formed so as to form plural transistor elements. Then conductor films 18 connected with the transistor elements is formed to a prescribed shape by photolithographic process and the metallic layer 12 in the picture element electrode sections is removed by etching. As a result, the transparent picture element electrode composed only of the transparent electrode film is formed.</p> |
