发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain the titled composition having an improved storage stability at a high temp. and relative low humidity condition by specifying an amount of an initiator for a vinyl polymerization which is used for the polymerization of vinyl polymer contd. in the photosensitive layer to less than the prescribed value. CONSTITUTION:The content of the initiator for the vinyl polymerization contd. in the photosensitive composition is <=0.5wt% on the weight basis of the total solid matter in the photosensitive composition contg. a diazo compd. and the vinyl polymer. For the purpose mentioned above, after stopping the polymerization reaction of the vinyl polymer, the reaction mixture is poured in water, an organic solvent or a mixture of water and the org. solvent, and is precipitated the obtd. vinyl polymer, thereby removing an unreacted polymerization initiator. Or, the unreacted polymerization initiator is decomposed by thermally treating the solution which dissolves the reaction mixture or the synthesized polymer to the solvent.
申请公布号 JPS62276541(A) 申请公布日期 1987.12.01
申请号 JP19860119388 申请日期 1986.05.26
申请人 MITSUBISHI CHEM IND LTD;KONICA CORP 发明人 MAEDA YOSHIHIRO;HIRASAWA HIROMI;GOTO SEI;SUZUKI NORIHITO
分类号 G03F7/038;G03F7/26 主分类号 G03F7/038
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