发明名称 MOS transistor
摘要 A gate electrode (4') of a MOS transistor is formed in a depression (16) provided in a substrate (1). Source and drain regions (6 and 7) of the MOS transistor are formed in the substrate (1) to be opposed to each other with the gate electrode (4') being located therebetween.
申请公布号 US4710790(A) 申请公布日期 1987.12.01
申请号 US19840627470 申请日期 1984.07.03
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 OKAMOTO, TATSUO;EGUCHI, KOUJI;OOSAKI, SABUROU
分类号 H01L21/336;H01L29/41;H01L29/423;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L21/336
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