| 摘要 |
PURPOSE:To carry in and out a wafer under the state in which the wafer is isolated from the outside air by housing a boat loader into a shielding space communicated with a reaction pipe through an opening for a furnace body while being communicated with a clean room through a door. CONSTITUTION:Three vertical type semiconductor thermal treatment equipments 10-12 are disposed into a clean room 14, and mutually isolated shielding spaces 20-22 are constituted to the upper sections of each furnace body 16 in an outside-air inclusion preventive device 13. A conduit 24 for supplying an inert gas is arranged to the upper sections of the shielding spaces 20-22, branch pipes 30-32 in the conduit 24 are extended into each shielding space, and flow control valves 40-42 are mounted to respective branch pipe 30-32. Wall surfaces are organized of a heat-resistant material, from which impurities are not precipitated even at a high temperature, including a door 60 for the shielding spaces in the shielding spaces 20-22, and boat loaders 50, 51 are each fitted at the upper ends of the corresponding furnace bodies 16. Accordingly, wafers can be carried in and out under an inert-gas atmosphere having high purity.
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