| 摘要 |
PURPOSE:To drive a rotary stage continuously to draw a pattern by providing a straight travelling stage which moves the rotary stage in a plane approximately perpendicular to the direction of electron beam irradiation. CONSTITUTION:A wafer 30 is coated with resist. A set of electron guns 21, irradiation resists 22, forming apertures 23, blankers 24, blanking apertures 25, object lenses 26 and deflectors 27 are arranged in one row along the direction X with 5mm pitches and the electron beams 32 and 33 are controlled with this pitch. A straight travelling stage 28 has a function to travel along the direction X and a rotary stage 29 has a function to turn counter-clockwise with a rotaty shaft 3 as a center when the stage is looked down from the top. With this constitution, a pattern can be drawn by driving the rotary stage continuously so that a required forming aperture image can be focused even if the deflection width is small and the deflection width of the deflector can be small.
|
