发明名称 AUTOMATIC CLEANING DEVICE FOR EXPOSURE MASK
摘要 PURPOSE:To nearly eliminate the production of dust at the time of the cleaning of a mask, and to almost automate operation and improve operation efficiency by providing a stage, a pure water nozzle, a lamp house, an upward/downward moving arm, a horizontal moving arm, a driving arm, and a rotary actuator. CONSTITUTION:When a mask M is set on the stage 3, a positioning jig 4 moves back, the driving arm 19 also moves back in an unclamping state, and the stage 3 beings to rotate. Pure water is injected from the pure water nozzle 5 at the upper part to clean up the surface of the mask M and the driving arm 19 moves after the washing of the surface to clamp the mask M again and moves up while clamping the surface-washed mask M. Then, the arm moves up from a point A to a point B and the rotary actuator 20 rotates thereby 180 deg. to set the mask M upside down. Then the driving arm 19 is lowered to set the mask M on the stage 3, whose reverse surface is washed.
申请公布号 JPS62275266(A) 申请公布日期 1987.11.30
申请号 JP19860119531 申请日期 1986.05.22
申请人 MITSUBISHI ELECTRIC CORP 发明人 ONO TOSHIO
分类号 B08B3/02;G03F1/00;G03F1/82;H01L21/304 主分类号 B08B3/02
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