| 摘要 |
PURPOSE:To prevent the breakdown of an interconnection electrode at the step part of an insulating film, by providing an interconnection layer, whose cross section has the gentle inclination of an edge with respect to the inclination of the edge of the insulating film at a contact hole part. CONSTITUTION:A conductor layer is formed on the entire surface of a substrate 1, in which a contact hole 5 is formed. Thereafter, said conductor layer undergoes etch back by an anisotropic etching method. Since the etching advances only in the vertical direction, the conductor layer remains at the side wall of the contact hole 5. Thus, the cross section having a gentle tapered shape is formed. Under this state, an interconnection layer 6 is formed. Even if the thickness of the interconnection layer 6 becomes thin at the side surface of the contact hole 5, the part is covered by said conductor layer. Thus the step coverage is improved. Therefore, the breakdown at the step part becomes almost negligible.
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