发明名称 REDUCTION STEPPER
摘要 PURPOSE:To make it easy to discover the deffects caused by the shadow of foreign matters, by setting a reduction ratio of the image of an original sheet to an object to be exposed as a larger value than the actual exposure ratio, and making it changeable. CONSTITUTION:A reduction optical system 6 is arranged between an original sheet 5 and an object 2 to be exposed. The image of the original sheet 5 is reduced by a specified actual exposure ratio, and projected on an object 2 to be exposed. In such a reduction projection aligner, the reduction ratio of the image of the original sheet 5 to the object 2 to be exposed is set as a larger value than the actual exposure ratio, and made changeable. When, prior to an actual exposure process, the object 2 to be exposed is exposed for a test, and foreign matters attaching to the original sheet are indirectly detected, a larger reduction ratio than the actual exposure ratio is applied to the exposure. Thereby it is made easy to discover defects caused by the shadow of foreign matters projected on the object to be exposed, the dection accuracy of foreign matters is improved, and the time necessary for detection is reduced.
申请公布号 JPS62274719(A) 申请公布日期 1987.11.28
申请号 JP19860117391 申请日期 1986.05.23
申请人 HITACHI MICRO COMPUT ENG LTD;HITACHI LTD;HITACHI HOKKAI SEMICONDUCTOR LTD 发明人 OZAKI KATSUMI;NAGAO MAKI;NOZAKI KATSUHIRO;NAKADA SHOJI
分类号 H01L21/30;G03F7/20;H01L21/027;H01L21/66 主分类号 H01L21/30
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