| 摘要 |
PURPOSE:To prevent an organic insulation film from being exposed directly by eliminating the organic insulation film projected to the surrounding of a tip part of a magnetic pole till the film is retrogressed from a head floating position. CONSTITUTION:A lower electrode 2, an inorganic insulation film, the 1st insulation layer 4, a coil, the 2nd insulation layer 6 and an upper magnetic pole 7 are formed. Then a Cu film as a dry etching resistance mask is formed and a resist pattern 9 is formed except the vicinity of the tip of the magnetic pole. Then the pattern 9 is used as a mask and the said Cu is removed selectively by etching together with the magnetic pole and the pattern 9 is removed. Then the layer 4 projected to the surrounding of the magnetic pole is removed selectively by the reactive etching. Then the Cu of the mask is eliminated, the protection film is formed and the result is finished by slider processing. Through the method above, since the surrounding of the magnetic pole is coated by the protection film, the in-take of water content from the layer 4 is prevented. |
