发明名称 ELECTRON BEAM EXPOSING DEVICE
摘要 PURPOSE:To form an accurate pattern by preparing a function for maintaining a temperature constant in an aperture for shaping an electron beam to eliminate the variation in a shaped beam size due to a variation in an electron beam emitting time. CONSTITUTION:An aperture 1A has a rectangular opening 2 at the center, and buries a linear heater 3 therein along the outer periphery of the opening 2. The temperature to be raised by the heater 3 in the aperture 1A is set by considering the temperature rising by the emission of an electron beam, the heating of the heater 3 is suppressed to low during a period that the aperture 1A is emitted by the beam, the aperture 1A is heated by the heater 3 during a period that the aperture 1A is not emitted by the beam to maintain the temperature of the aperture 1A during the operation constant, thereby compensating the shape size of the opening 2 constantly.
申请公布号 JPS62272529(A) 申请公布日期 1987.11.26
申请号 JP19860115775 申请日期 1986.05.20
申请人 NEC CORP 发明人 NISHIGUCHI TAKAO
分类号 H01J37/09;G03F7/20;H01J37/305;H01L21/027 主分类号 H01J37/09
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