| 摘要 |
PURPOSE:To continue a vapor growth for a long period without depositing a reactive substance to be deposited on the tubular wall of a reaction tube during a growing reaction by feeding gas containing constituent element of the substance only through the center of the tube and feeding nonreactive gas to a regions along upper and lower tubular walls. CONSTITUTION:A material supply port 11 is so provided at the central region of a reaction tube 1 as to feed gas containing constituent element of a substance to be deposited in a laminar state only to the central region of the tube 1. A high temperature gas supply port 12 is so provided at the top of the tube 1 as to feed nonreactive gas, such as high temperature hydrogen gas along the upper layer of the tube 1. A low temperature gas supply port 13 is so provided at the bottom of the tube 1 as to feed nonreactive gas, such as low temperature hydrogen gas along the lower layer of the tubular wall of the tube 1. In an optical vapor growing apparatus of this structure, the nonreactive gas flows along the upper and lower tubular walls, the gas containing the constituent of the substance flows only at the central region where a substrate 5 exists and does not contact the tubular wall. Thus, no material is deposited on the tubular wall.
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