发明名称 A PROCESS FOR PRODUCING A SINGLE CRYSTAL SEMICONDUCTOR ISLAND ON AN INSULATOR
摘要 <p>A process for producing a single crystalline semiconductor island on an insulator, comprising the steps of providing a semiconductor island comprising a nonmonocrystalline semiconductor on an insulator; forming an energy-absorbing cap layer which coats at least the upper and side surfaces of the semiconductor island; irradiating the energy-absorbing cap layer with an energy beam; and melting and transforming the coated nonmonocrystalline semiconductor into a single crystalline semiconductor with the heat generated in the energy-absorbing cap layer.</p>
申请公布号 DE3466910(D1) 申请公布日期 1987.11.26
申请号 DE19843466910 申请日期 1984.04.27
申请人 FUJITSU LIMITED 发明人 MUKAI, RYOICHI
分类号 H01L21/20;H01L21/268;(IPC1-7):H01L21/268 主分类号 H01L21/20
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